Microstructure and Mechanical Properties of TiN/Ti2AlN Multilayers
نویسندگان
چکیده
Titanium nitride (TiN) thin films deposited by high-power pulsed magnetron sputtering usually have a high compressive residual stress, which is not conducive for the adherence of TiN films. This study investigated potential Ti2AlN releasing stress HPPMS-deposited and evaluated strength hardness TiN/Ti2AlN multilayers introducing MAX phase to form multilayers. The results showed that smooth with (111) (002) textures were successfully synthesized HPPMS deposition subsequent vacuum annealing. in was released Ti2AlN. improved after release close annealed TiN. provides novel approach hard ceramic using phase.
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ژورنال
عنوان ژورنال: Coatings
سال: 2023
ISSN: ['2079-6412']
DOI: https://doi.org/10.3390/coatings13020329